ADSORPTION OF ATOMIC AND MOLECULAR OXYGEN ON Si ( 00 1 ) 2 x 1 : COVERAGE DEPENDENCE OF THE AUGER O K V V LINESHAPE
نویسنده
چکیده
By means of Auger electron spectroscopy (AES) we have monitored the room temperature adsorption of 02 and N20 on the clean Si(0 0 1)2 x I surface. We have found, for the first time, a significant variation in the intensity ratio of the K Lt L~ and K L23 L23 O Auger lines in the submonolayer range. This variation can be related to a change in bonding configuration of the oxygen atom/molecule in the initial adsorption stage in which the influence of inter-atomic matrix elements of the Auger process cannot be neglected.
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تاریخ انتشار 2002